7 . Zone - Plate - Array Lithography ( ZPAL ) : The System
نویسندگان
چکیده
In semiconductor lithography, glass masks are illuminated with deep UV laser light and their image is reduced through a lens onto the substrate to define circuitry. As feature sizes are pushed towards 100 nm and smaller, lithography systems and masks are becoming increasingly complex and costly (~$1 million per mask set). In addition, the delay in obtaining a mask set, with complex optical-proximity correction and phase-shifting features can be months. This presents a huge hurdle to continuing progress in semiconductor technology.
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